MSE 5410

MSE 5410

Course information provided by the 2016-2017 Catalog.

This course will give an introduction to modern nanofabrication technologies with emphasis on integrated circuits manufacturing. Thermal budget, scaling of geometry, pitch and registry and control of parametric yield will be used for integration guidelines. Physical principles and process modeling will be covered in lectures and labs will include a series of fabrication steps of lithography, metallization, plasma etching and annealing to produce semiconductor devices (Schottky diodes, pn junction diodes, MOS capacitors, and MOSFETs). Recent advances in nanofabrication will be briefly reviewed for their possible technology insertion and main integration challenges.


Prerequisites/Corequisites Prerequisites: ECE 3150, CHEM 2090 or CHEM 2070/CHEM 2080.

When Offered Spring.

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Syllabi: none
  •   Regular Academic Session.  Choose one lecture, one discussion, and one laboratory. Combined with: ECE 4360

  • 3 Credits Graded

  • 13054 MSE 5410   LEC 001

  • Instruction Mode: In Person

  • 13055 MSE 5410   DIS 201

  • Instruction Mode: In Person

  • 13056 MSE 5410   LAB 402

    • W
    • Xing, H

  • Instruction Mode: In Person